Radioelektronikos terminų žodynas. – Vilnius : BĮ UAB „Litimo“. Kazimieras Gaivenis, Gytis Juška, Vidas Kalesinskas. 2000.
ultraviolet projection lithography installation — ultravioletinės projekcinės litografijos įrenginys statusas T sritis radioelektronika atitikmenys: angl. ultraviolet projection lithography installation vok. Ultraviolettbelichtungsprojektionsanlage, f; Ultraviolettprojektionsanlage, f rus.… … Radioelektronikos terminų žodynas
ultraviolet projection printing — ultravioletinė projekcinė litografija statusas T sritis radioelektronika atitikmenys: angl. ultraviolet projection lithography; ultraviolet projection printing vok. Projektionslithografie mit Ultraviolettlicht, f rus. ультрафиолетовая… … Radioelektronikos terminų žodynas
lithographie de projection à exposition ultraviolette — ultravioletinė projekcinė litografija statusas T sritis radioelektronika atitikmenys: angl. ultraviolet projection lithography; ultraviolet projection printing vok. Projektionslithografie mit Ultraviolettlicht, f rus. ультрафиолетовая… … Radioelektronikos terminų žodynas
installation de lithographie de projection à exposition ultraviolette — ultravioletinės projekcinės litografijos įrenginys statusas T sritis radioelektronika atitikmenys: angl. ultraviolet projection lithography installation vok. Ultraviolettbelichtungsprojektionsanlage, f; Ultraviolettprojektionsanlage, f rus.… … Radioelektronikos terminų žodynas
Computational lithography — (also known as computational scaling) is the set of mathematical and algorithmic approaches designed to improve the resolution attainable through photolithography. Computational lithography has come to the forefront of photolithography in 2008 as … Wikipedia
Extreme ultraviolet lithography — (also known as EUV or EUVL ) is a next generation lithography technology using the 13.5 nm EUV wavelength. EUVL opticsEUVL is a significant departure from the deep ultraviolet lithography used today. All matter absorbs EUV radiation. Hence, EUV… … Wikipedia
Next-generation lithography — (NGL) is a term used in integrated circuit manufacturing to describe the lithography technologies slated to replace photolithography. As of 2009 the most advanced form of photolithography is immersion lithography, in which water is used as an… … Wikipedia
Electron beam lithography — (often abbreviated as e beam lithography) is the practice of scanning a beam of electrons in a patterned fashion across a surface covered with a film (called the resist),cite book |last= McCord |first=M. A. |coauthors=M. J. Rooks |title=… … Wikipedia
Projektionslithografie mit Ultraviolettlicht — ultravioletinė projekcinė litografija statusas T sritis radioelektronika atitikmenys: angl. ultraviolet projection lithography; ultraviolet projection printing vok. Projektionslithografie mit Ultraviolettlicht, f rus. ультрафиолетовая… … Radioelektronikos terminų žodynas
ultravioletinė projekcinė litografija — statusas T sritis radioelektronika atitikmenys: angl. ultraviolet projection lithography; ultraviolet projection printing vok. Projektionslithografie mit Ultraviolettlicht, f rus. ультрафиолетовая проекционная литография, f pranc. lithographie de … Radioelektronikos terminų žodynas
